To understand the atomic mechanism behind the reconfigurable and non-volatile responsivity of MoS2 M/S/M devices, we conducted a series of experiments using WDS characterizations, Kelvin probe force microscope (KPFM), and Sentaurus-TCAD simulation. We observed the in-situ distribution of sulfur atoms in the MoS2 channel by applying voltage biases to the M/S contact, creating an in-plane electric field of approximately 10 MV/cm. Our results, shown in Fig. 3a, revealed that before applying voltage pulses, the sulfur atoms were uniformly distributed across the channel. The red signal in WDS map shows the distribution of sulfur atoms in the channel. From Fig. 3a-i and Fig. 3a-ii, the WDS map and corresponding elemental spectrum demonstrate uniform sulfur distribution across the MoS2 channel before electric pulse programming. However, after applying a negative voltage pulsing (amplitude, -10 V; duration, 10 s) on anode (with cathode grounded, Fig. 3b-i), the MoS2 channel shows the obvious absence of sulfur atoms near anode indicating the migration of sulfur vacancies. In Fig. 3b-ii, the intensity of sulfur atoms near the anode is lower than the intensity of sulfur atoms near the cathode.
To demonstrate the reversible migration of sulfur vacancies, positive (amplitude, + 10 V; duration, 10 s) electric pulses are applied to anode in sequence; the MoS2 channel restoring to its initial uniform sulfur distribution indicating the reversible migration of sulfur ions (Fig. 3c-i). And the uniform distribution of sulfur atoms is observed in elemental spectrum as shown in Fig. 3c-ii. The device schematics illustrate the sulfur atom migration near anode and cathode (Fig. 3a-iii, Fig. 3b-iii and Fig. 3c-iii). After the positive/negative electric pulses, the distribution of sulfur atom changes the ions density at anode and cathode. Since the layered MoS2 offers ionic pathways with low activation energy, the sulfur ions have a high in-plane diffusivity35, 36. Therefore, the sulfur ion migration in the MoS2 channel, driven by an electric field, modifies the local sulfur concentration. The increase/decrease in the local S ion concentration leads to the dynamic decrease/increase of Schottky barrier height37, 38. The asymmetric Schottky barrier of M/S contact can facilitate the separation of photo-generated electron-hole pairs due to the potential gradient leading to a large Isc. Moreover, like memristors, the multiple photocurrent states are non-volatile because the barrier is modulated by ion concentration which remains fixed in the absence of a large electric field. The asymmetric distribution of sulfur ions in the MoS2 channel results in a strong photovoltaic effect with a maximum Isc of -795 nA and Voc of 60 mV (Supplementary Information Fig. 12). Also, the maximum optical responsivity of 369.22 mA/W was achieved with ionic migration.
We further conducted KPFM measurements (to map the magnitude and potential of MSM device, Fig. 3d) verifying the dynamic modulation of the Schottky barrier at the metal/MoS2/metal junction with various voltage programming conditions. The results, shown in Fig. 3e, indicated that the Schottky barrier height at the anode region (high sulfur vacancy concentration) was lower than that at the cathode region (low sulfur vacancy concentration), with a difference of approximately 50 meV. In contrast, the pristine MoS2 device displayed a symmetric Schottky barrier (Supplementary Information Fig. 13). These results were consistent with the WDS maps, which showed that a negative voltage applied to the anode attracts sulfur vacancies towards the anode and reduces the number of vacancies near the cathode, leading to the formation of Schottky or Ohmic contact at the metal/MoS2 interface and affecting the observed Isc and Voc. To further understand the impact of the asymmetric Schottky barrier on photocurrent, we used Sentaurus-TCAD to simulate the band structure, electric field distribution, and photocurrent response of the metal/MoS2/metal device. The simulated band structure, shown in Fig. 3f, displayed the potential gradient induced by the asymmetric Schottky barrier. Figure 3g also showed an obvious Isc due to the asymmetric Schottky barrier. The simulated electron density distribution with different barrier at anode and cathode under illumination are shown in Supplementary Information Fig. 14. The lower anode barrier corresponds to the larger Isc, confirming the experiment results.
Overall, our theoretical and experimental results discussed above demonstrate that the reconfigurable and non-volatile responsivity of M/S/M photodetectors is due to the electric field-driven redistribution of sulfur vacancies, which dynamically changes the Schottky barrier and doping profile.