3.1. Teflon FEP model structures and HOMO/LUMO orbital distribution:
The chemical composition of Teflon FEP originally recommended that Teflon FEP gets connected with ZnO through various sites to decide the correct site of interaction of Teflon FEP with MOs, since the interaction of Teflon FEP with other chemical structures and its active sites are unpredictable or unknown. The contact of Teflon FEP with ZnO occurs at numerous sites due to the oxygen atom of ZnO (Ezzat 2019), since MOs interact with other chemical structures through the oxygen atom. As shown in Fig. 1, the optimized structures and their HOMO/LUMO orbital distribution of OZn interaction with Teflon FEP were explored at different places (P1, P2, P3, and P4), such that he interaction of OZn with Teflon FEP was simulated as an adsorption state interaction. The main parameters for assessing the electrical properties of materials are TDM and ΔE. The relationship between the increase in TDM and the decrease in ΔE can be used to predict the site through which Teflon FEP should interact with OZn. Table 1 shows that the interaction of Teflon FEP with OZn resulted in a change in the values of TDM which increased from 0.669 to 7.4256, 5.4734, 5.3226 and 4.4706 Debye for Teflon FEP + OZn (P1, P2, P3 and P4) respectively, while ΔE decreased from 7.4391 to 2.3043, 2.2134, 1.7799 and 2.2466 eV for Teflon FEP + OZn for P1, P2, P3 and P4 respectively. The lowest value of ΔE was recorded for Teflon FEP + OZn P3 which, therefore, represents the most suitable position of interaction for Teflon FEP.
Table 1
DFT:B3LYP/LANL2DZ calculations for Teflon FEP and Teflon FEP interaction with OZn through different sites of Teflon FEP structure as TDM (Debye) and ∆E (eV).
Structure
|
TDM
|
∆E
|
Teflon FEP
|
0.669
|
7.4391
|
Teflon FEP + OZn P1
|
7.4256
|
2.3043
|
Teflon FEP + OZn P2
|
5.4734
|
2.2134
|
Teflon FEP + OZn P3
|
5.3226
|
1.7799
|
Teflon FEP + OZn P4
|
4.4706
|
2.2466
|
Accordingly, 4 units of Teflon FEP were interacted with 4 ZnO, SiO2 and a combination of the ZnO and SiO2. In the case of the interaction of a combination of ZnO and SiO2 with Teflon FEP, the interaction was supposed to happen as sandwich; once as Teflon FEP + 4OZn + 4OSiO and once as Teflon FEP + 4OSiO + 4OZn, and other as ZnO and SiO2 together interacted with Teflon FEP atom by atom (Teflon FEP + 4OZn/4OSiO) as illustrated in Fig. 2. TDM and ∆E were calculated for the different proposed types of interaction. TDM increased from 0.669 Debye of Teflon FEP alone to 7.4534, 21.2799, 12.2910, 13.2651 and 5.7131 Debye for Teflon FEP + 4ZnO, Teflon FEP + 4OSiO, Teflon FEP + 4OZn + 4OSiO, Teflon FEP + 4OSiO + 4OZn, and Teflon FEP + 4OZn/4OSiO respectively as illustrated in Table 2. Moreover, ∆E decreased for the same structures from 7.439 to 0.5200, 0.5007, 0.2195, 0.5606 and 0.3135 eV respectively. The lowest value of ∆E observed was for Teflon FEP + 4OZn + 4OSiO which is an indication for the most probable interaction to occur, which enhanced the electrical properties of the Teflon FEP.
Table 2
DFT:B3LYP/LANL2DZ calculations as TDM (Debye) and band gap energy ∆E (eV) for Teflon FEP and Teflon FEP interacted with 4 ZnO, SiO2 and a combination of the two MOs.
Structure
|
TDM
|
∆E
|
Teflon FEP
|
0.669
|
7.439
|
Teflon FEP+ 4 ZnO
|
7.4534
|
0.5200
|
Teflon FEP + 4 OSiO
|
21.2799
|
0.5007
|
Teflon FEP + 4OZn + 4OSiO
|
12.2910
|
0.2195
|
Teflon FEP + 4OSiO + 4OZn
|
13.2651
|
0.5606
|
Teflon FEP + 4OZn/4OSiO
|
5.7131
|
0.3135
|
3.2. Molecular Electrostatic Potential (MESP):
In order to evaluate the interaction identity of nucleophilicity, MESP was investigated using LANL2DZ basis set for the implemented Teflon FEP structure using the DFT method. The MESP maps for Teflon FEP, Teflon FEP + 4ZnO, Teflon FEP + 4OSiO, Teflon FEP + 4OZn + 4OSiO, Teflon FEP + 4OSiO + 4OZn, and Teflon FEP + 4OZn/4OSiO are shown in Fig. 3. The MESP maps show the calculation of neighbouring charges, nucleus and electron concentration at a given location. The MESP map is classified as red < orange < yellow < green < blue. The colour difference in the MESP map, which is red, indicates the lowest MESP level while blue indicates reaching the maximum MESP value. As shown in Fig. 3, the MESP maps for all connections appear coloured with intermediate colours between red and blue, which represents less electrostatic repulsion and indicates that there is still no possibility of interacting with other chemical structures, thus reflecting more chemical stability.
3.3. Quantitative Structure Activity Relationship (QSAR):
QSAR descriptors total energy (TE), heat of formation (HF), ionization potential (IP), logarithm of the partition coefficient (log P), polarization, molar refractivity (MR) and molecular weight (MW) were calculated for Teflon FEP and Teflon FEP interactions with MO as Teflon FEP + 4 ZnO, Teflon FEP + 4 OSiO, Teflon FEP + 4OZn + 4OSiO, Teflon FEP + 4OSiO, Teflon FEP + 4OSiO + 4OZn and Teflon FEP + 4OZn as shown in Table 3. TE is reported to characterize the stability upon the mechanism but whenever TE decreases, the structure is described as more durable. TE values of Teflon FEP + 4ZnO, Teflon FEP + 4OSiO, Teflon FEP + 4OSiO, Teflon FEP + 4OZn + 4OSiO, Teflon FEP + 4OSiO + 4OZn and Teflon FEP + 4OZn/4OSiO were − 21251.090, -22705.140, -24230.924, -25747.075, -25709.596 and − 23487.043 eV respectively, indicating very stable structures.
HF is a fundamental thermal descriptor that represents the energy generated as heat when atoms, existing at theoretically infinite distances, connect and build a molecule. Although HF is a concern, it could be explained by the variation in enthalpy during the creation of a single mole of a material from its components in its normal and complete equilibrium under standard atmospheric conditions at a particular temperature. HF values for Teflon FEP + 4ZnO, Teflon FEP + 4OSiO, Teflon FEP + 4OSiO, Teflon FEP + 4OZn + 4OSiO, Teflon FEP + 4OSiO + 4OZn and Teflon FEP + 4OZn/4OSiO were − 1570.764, -1838.877, -2292.065, -2726.749, -2488.378 and − 2042.500 respectively, reflecting the production of a small amount of energy for Teflon FEP + 4OZn + 4OSiO.
The following descriptor is the IP which characterizes the reactivity of the compound and is defined as the energy required for the compound to also be ionized, meaning that the lower the IP value, the higher the reactivity of such compound. Results indicated no significant differentiation between the IP values that measured − 12.980, -9.759, -11.684, -9.450, -11.074 and − 9.851 for Teflon FEP, Teflon FEP + 4 ZnO, Teflon FEP + 4 OSiO, Teflon FEP + 4OZn + 4OSiO, Teflon FEP + 4OSiO + 4OZn and Teflon FEP + 4OZn/4OSiO respectively. The increased IP values confirm that the reactivity of the new structures is quite low, with the lowest reactivity obtained was for Teflon FEP + 4OZn + 4OSiO.
Log P is a definition of the hydrophilicity of the chemical substance. Log P is the ratio of the concentration of a substance dissolved in, for example, an organic solution to its concentration dissolved in an aqueous solvent at equilibrium. As a consequence, positive log P values are corresponding to hydrophobic compounds, while negative values are corresponding to hydrophilic compounds. All suggested models resulted in positive log P values, indicating that the compounds are hydrophobic, chemically soluble and are not affected by the surrounding medium.
The final QSAR descriptor is polarizability which is described as a basic property that defines how the chemical structure could be polarized in response to variation forces, which reflects the reactivity of the structures influenced by their volume. In fact, MR is a descriptor which determines the total polarization of a mole of the substance, such that the higher the molar refractivity, the higher the reactivity of the substance.
The obtained results support the theory that a layer of OZn and SiO2 on Teflon FEP, in the form of Teflon FEP + OZn + OSiO, improves the physical, chemical, thermal, and electrical stability of Teflon FEP, which might serve as a corrosion-inhibiting layer for Teflon FEP that is prone to corrosion during space missions.
Table 3
QSAR descriptors as Total Energy (eV), Heat of formation (HF), Ionization potential (eV), Log P, Polarizability, Molar refractive (MR), molecular weight (MW) calculated at PM6 level for Teflon FEP and Teflon FEP interacted with 4ZnO, 4SiO2 and a combination of both MOs.
Sample
|
TE
|
HF
|
IP
|
Log P
|
Polarizability
|
MR
|
MW
|
Teflon FEP
|
-21251.090
|
-1969.435
|
-13.328
|
12.801
|
28.228
|
1002.166
|
802.136
|
Teflon FEP + 4OZn
|
-22705.140
|
-1838.877
|
-9.759
|
11.396
|
53.506
|
1327.800
|
1327.800
|
Teflon FEP + 4OSiO
|
-24230.924
|
-2292.065
|
-11.684
|
9.990
|
44.738
|
1242.503
|
1242.503
|
TeflonFEP + 4OZn + 4OSiO
|
-25747.075
|
-2726.749
|
-9.450
|
8.584
|
55.772
|
1568.137
|
1568.137
|
TeflonFEP + 4OSiO + 4OZn
|
-25709.596
|
-2488.378
|
-11.074
|
8.584
|
58.688
|
1568.137
|
1568.137
|
Teflon FEP + 4OZn/4OSiO
|
-23487.043
|
-2042.500
|
-9.851
|
10.693
|
46.500
|
1285.151
|
1285.151
|